Conductive oxide sputtering target
ITO Sputtering Target & Tablet
- ANP has developed a high quality of ITO target for its typical applications of ITO-coated substrates include electrodes for flat panel displays, touch panel contacts, energy saving & automobile windows, optoelectronic devides & solar panels, etc.
ITO & IGZO Rotary Target
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ITO Tablet |
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ITO Rotary Ta rget Specification
- Composition : In2O3 (90.0±0.5). SnO2 (10.0±0.5)
- Actual Density
Above 99.5% of the theoretical material density
- Purity : Above 99.99%
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ITO TABLET SPECIFICATION
- Composition : 95wt% In²O³ + 5wt% SnO²
- Actual Density : 4.0 ~ 7.1g/cm3
- Purity : >99.99%
- Size : Φ38x40T, Φ30x40T, Φ25x15T, Φ20, Φ15, Φ10, others
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Product Application
- Transparent Conductive Electrode such as LCD,
Touch PanelScreen, PDP, Organic Windows
- LED Wafer Chip
- EMI Shield Coating
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IGZO Rotary Ta rget Specification- Composition - In : Ga : Zn = 1:1:1, 2:2:1, 2:1:2, 4:2:1, others
- Actual Density
Above 99% of the theoretical material density
- Purity : Above 99.99%
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