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ITO Sputtering Target & Tablet |
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Product Description |
ANP has developed a high quality of ITO target for its typical applications of ITO-coated substrates include electrodes for flat panel displays, touch panel contacts, energy saving & automobile windows, optoelectronic devices & solar panels, etc. |
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Product Specification |
1. Composition
The standard spec is 90wt% In2O3 + 10 wt%SnO2, but other compositions are available on request.
2. Density
Broad range of target density is available from low to ultra high grade for the customers requirements.
ANP¡¯s ultra high ITO yields the highest density of 99% of the theoretical material density
| Product |
Density (g/cm3) |
Deposit Method |
| Low Density Tablet |
3.0 ~ 5.0 |
E-beam, Ion Plating |
| Super High Density Target |
¡Ã7.1 |
Ion Plating, Sputtering |
3. Purity ¡Ã99.99%
4. Dimension
Different sizes and shapes for customer¡¯s needs
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ITO Rotary Target |
ITO Rotary Target Specifiaction
Composition : In2O3 (90.0¡¾0.5), SnO2 (10.0¡¾0.5)
Actual Density : >7.0 g/§¨
(Above 98% of the theoretical material density )
Purity : Above 99.99%
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Product Characteristics |
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ANP¡¯s ITO target has been made by utilizing its
specialized nano powder production including raw
material manufacturing process in house which
ensures customers a superior, high quality end
products
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High Conductivity : < ¥ñ = 1.7¡¿10-4 §Ù¡¤§¯ |
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High Transparence : > 85% |
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No or Little Time Dependency of Physical Properties |
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No or Little Scattering Particles during Evaporation |
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Rare occurrence of crack development during evaporation |
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Microscopic Photo |
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Product Application Area |
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ATransparent Conductive Electrode (LCD, Touch Panel Screen, PDP, Organic EL, Solar Cell) |
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EMI Shield Coating |
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