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ITO Sputtering Target |
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ITO Sputtering Target |
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Product Description |
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ANP has developed a high quality of ITO target for its typical applications of ITO-coated substrates
include electrodes for flat panel displays, touch panel contacts, energy saving & automobile windows,
optoelectronic devices & solar panels, etc.
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Product Specification |
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1. Composition
The standard spec is 90wt% In2O3 + 10 wt%SnO2, but other compositions are available on request.
2. Density
Broad range of target density is available from low to ultra high grade for the customers
requirements.
ANP¡¯s ultra high ITO yields the highest density of 99% of the theoretical material density
Product |
Density(g/cm3) |
Deposit Method |
Low Density Tablet |
3.0 ~ 5.0 |
E-beam, Ion Plating |
Super High Density Target |
¡Ã7.1 |
Ion Plating, Sputtering |
3. Purity
¡Ã 99.99%
4. Dimension
Different sizes and shapes for customer¡¯s needs
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Product Characteristics |
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- ANP¡¯s ITO target has been made by utilizing its specialized nano powder production
including raw material manufacturing process in house which ensures customers
a superior, high quality end products
- High Conductivity : < ¥ñ = 1.7¡¿10-4 §Ù¡€§¯
- High Transparence : > 85%
- No or Little Time Dependency of Physical Properties
- No or Little Scattering Particles during Evaporation
- Rare occurrence of crack development during evaporation
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Microscopic photo |
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Product Application Area |
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- Transparent Conductive Electrode (LCD, Touch Panel Screen, PDP, Organic EL and etc)
- EMI Shield Coating |
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Other sputtering targets |
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- Zinc Oxide
- Indium Zinc Oxide
- Aluminum Zinc Oxide
- Indium Zinc Gallium Oxide
- Others (Metal & Metal Oxide target)
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